RF MEMS, NEMS/MEMS for Biomedical Applications, Nano/Micro Fabrication, Solar Cells, Energy Harvesters, MEMS Reliability.
Selected Publications
S. N. R. Kazmi, C. Salm and J. Schmitz, “Deep reactive ion etching of in-situ boron doped LPCVD Ge0.7Si0.3 using SF6 and O2 plasma”, Journal of Microelectronic Engineering (Elsevier),Vol. 110, pp. 311-314, (2013).
S. N. R. Kazmi, C. Salm and J. Schmitz, “Mechanical resonators on CMOS for integrated passive band pass filters”, Proceedings of 14th International Conference on Ultimate Integration on Silicon (ULIS), Warwick, UK, (2013).
S. N. R. Kazmi, A. A. I. Aarnink, C. Salm and J. Schmitz, “Low-Stress Highly-Conductive In-Situ Boron Doped Ge0.7Si0.3 Films by LPCVD”, ECS Journal of Solid State Science and Technology, Vol. 1, Issue 5, P222-P226, (2012).
S. N. R. Kazmi, A. A. I. Aarnink, C. Salm and J. Schmitz, “CMOS-MEMS Post Processing Compatible Capacitively Transduced GeSi Resonators”, Proceedings of International IEEE Frequency Control Symposium, Baltimore, Maryland, USA,(2012).